Demonstration lithography using plasma focus soft x-ray source
To demonstrate the soft x-ray source(SXR) developed and to gain experience in handling SXR masks and resists.
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Main Authors: | , , , , , , , , , |
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Other Authors: | |
Format: | Research Report |
Published: |
2008
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Subjects: | |
Online Access: | http://hdl.handle.net/10356/3044 |
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Institution: | Nanyang Technological University |
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