Demonstration lithography using plasma focus soft x-ray source

To demonstrate the soft x-ray source(SXR) developed and to gain experience in handling SXR masks and resists.

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Bibliographic Details
Main Authors: Lee, Sing, Wong, Terence Kin Shun, Feng, Xianping, Lee, Paul Choon Keat, Springham, Stuart V., Serban, Adrian, Liu, Mahe, Kudryashov, Vladimir, Gribkov, Vladimir A., Rajdeep Singh Rawat
Other Authors: School of Electrical and Electronic Engineering
Format: Research Report
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/3044
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Institution: Nanyang Technological University

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