Improvement on the uniformity and deviation of structured patterns for surface acoustic wave filters

This project is carried out with the main purpose of improving line-width uniformity and deviation across each wafer through optimization of the photolithography processes. In order to remain price competitive in the chip market, this project is also aimed at reducing production costs.

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Bibliographic Details
Main Author:	Ong, Eunice Ho Hui.
Other Authors:	Zhu, Weiguang
Format:	Theses and Dissertations
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
Online Access:	http://hdl.handle.net/10356/4999
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-4999
record_format	dspace
spelling	sg-ntu-dr.10356-49992023-07-04T16:38:49Z Improvement on the uniformity and deviation of structured patterns for surface acoustic wave filters Ong, Eunice Ho Hui. Zhu, Weiguang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging This project is carried out with the main purpose of improving line-width uniformity and deviation across each wafer through optimization of the photolithography processes. In order to remain price competitive in the chip market, this project is also aimed at reducing production costs. Master of Science (Microelectronics) 2008-09-17T10:02:59Z 2008-09-17T10:02:59Z 2005 2005 Thesis http://hdl.handle.net/10356/4999 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging Ong, Eunice Ho Hui. Improvement on the uniformity and deviation of structured patterns for surface acoustic wave filters
description	This project is carried out with the main purpose of improving line-width uniformity and deviation across each wafer through optimization of the photolithography processes. In order to remain price competitive in the chip market, this project is also aimed at reducing production costs.
author2	Zhu, Weiguang
author_facet	Zhu, Weiguang Ong, Eunice Ho Hui.
format	Theses and Dissertations
author	Ong, Eunice Ho Hui.
author_sort	Ong, Eunice Ho Hui.
title	Improvement on the uniformity and deviation of structured patterns for surface acoustic wave filters
title_short	Improvement on the uniformity and deviation of structured patterns for surface acoustic wave filters
title_full	Improvement on the uniformity and deviation of structured patterns for surface acoustic wave filters
title_fullStr	Improvement on the uniformity and deviation of structured patterns for surface acoustic wave filters
title_full_unstemmed	Improvement on the uniformity and deviation of structured patterns for surface acoustic wave filters
title_sort	improvement on the uniformity and deviation of structured patterns for surface acoustic wave filters
publishDate	2008
url	http://hdl.handle.net/10356/4999
_version_	1772825794130739200

Improvement on the uniformity and deviation of structured patterns for surface acoustic wave filters

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