Surface chemical study on the oxidation resistance of plasma-treated copper
In this article, we have also demonstrated the use of XPS, AES, FTIR, RS, XRD, TEM, FE-SEM for studying copper oxidation and, for the first time, studied the surface chemistry and oxidation-resistance of the C, N and Cu-containing films.
Saved in:
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Theses and Dissertations |
| Published: |
2008
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/10356/5054 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | Nanyang Technological University |