Development of massively parallel nanolithography

• Main Author: Lee, Sharon Mei Yi.
• Other Authors: School of Materials Science and Engineering
• Format: Final Year Project
• Language: English
• Published: 2013
• Subjects: DRNTU::Engineering
• Online Access: http://hdl.handle.net/10356/51499
• Institution: Nanyang Technological University

As technology is becoming more and more advanced every day, lithography techniques are also moving towards nanoscale production of components needed in integrated electronic circuits, micro electrochemical systems (MEMS) and in medical and biology field etc. An ideal lithography method is essential...