Development of massively parallel nanolithography

• المؤلف الرئيسي: Lee, Sharon Mei Yi.
• مؤلفون آخرون: School of Materials Science and Engineering
• التنسيق: Final Year Project
• اللغة: English
• منشور في: 2013
• الموضوعات: DRNTU::Engineering
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/51499
• المؤسسة: Nanyang Technological University

As technology is becoming more and more advanced every day, lithography techniques are also moving towards nanoscale production of components needed in integrated electronic circuits, micro electrochemical systems (MEMS) and in medical and biology field etc. An ideal lithography method is essential...