Development of photo-resist application process using pre-wet technique

This project studies the application of edge bead remover (EBR) chemical as a pre-wet before dispensing the photo-resist on to the wafer.

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Bibliographic Details
Main Author:	Anup Ramachandran
Other Authors:	Zhao, Yong
Format:	Theses and Dissertations
Published:	2008
Subjects:	DRNTU::Engineering::Manufacturing
Online Access:	http://hdl.handle.net/10356/5873
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Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-5873
record_format	dspace
spelling	sg-ntu-dr.10356-58732023-03-11T17:14:35Z Development of photo-resist application process using pre-wet technique Anup Ramachandran Zhao, Yong School of Mechanical and Production Engineering DRNTU::Engineering::Manufacturing This project studies the application of edge bead remover (EBR) chemical as a pre-wet before dispensing the photo-resist on to the wafer. Master of Science (Precision Engineering) 2008-09-17T11:01:16Z 2008-09-17T11:01:16Z 2004 2004 Thesis http://hdl.handle.net/10356/5873 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Manufacturing
spellingShingle	DRNTU::Engineering::Manufacturing Anup Ramachandran Development of photo-resist application process using pre-wet technique
description	This project studies the application of edge bead remover (EBR) chemical as a pre-wet before dispensing the photo-resist on to the wafer.
author2	Zhao, Yong
author_facet	Zhao, Yong Anup Ramachandran
format	Theses and Dissertations
author	Anup Ramachandran
author_sort	Anup Ramachandran
title	Development of photo-resist application process using pre-wet technique
title_short	Development of photo-resist application process using pre-wet technique
title_full	Development of photo-resist application process using pre-wet technique
title_fullStr	Development of photo-resist application process using pre-wet technique
title_full_unstemmed	Development of photo-resist application process using pre-wet technique
title_sort	development of photo-resist application process using pre-wet technique
publishDate	2008
url	http://hdl.handle.net/10356/5873
_version_	1761781645745061888

Development of photo-resist application process using pre-wet technique

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