Development of photo-resist application process using pre-wet technique
This project studies the application of edge bead remover (EBR) chemical as a pre-wet before dispensing the photo-resist on to the wafer.
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| Format: | Theses and Dissertations |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/5873 |
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| Institution: | Nanyang Technological University |