Chemical vapor deposition growth and characterization of two-dimensional hexagonal boron nitride

Atomically thin hexagonal boron nitride (h-BN) film is a highly attractive dielectric and a crucial material for next-generation high performance two-dimensional (2D) heterostructure devices. In this thesis, controllable growth of 2D h-BN films on various substrates using chemical vapor deposition (...

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Bibliographic Details
Main Author: Tay, Roland Yingjie
Other Authors: Teo Hang Tong Edwin
Format: Theses and Dissertations
Language:English
Published: 2016
Subjects:
Online Access:http://hdl.handle.net/10356/69026
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Institution: Nanyang Technological University
Language: English
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