Whole field curvature and residual stress determination of silicon wafers by reflectometry

• Main Authors: Ng, Chi Seng, Asundi, Anand Krishna
• Other Authors: Postek, Michael T.
• Format: Conference or Workshop Item
• Language: English
• Published: 2017
• Subjects: Reflectometry; Curvature measurement
• Online Access: https://hdl.handle.net/10356/80599; http://hdl.handle.net/10220/42172
• Institution: Nanyang Technological University

Reflectometry, a simple whole-field curvature measurement system using a novel computer aided phase shift reflection grating method has been improved to certain extend. The similar system was developed from our earlier works on Computer Aided Moiré Methods and Novel Techniques in Reflection Moiré,...