Reconfigurable phase-change photomask for grayscale photolithography

Reconfigurable phase-change photomask for grayscale photolithography

We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-cha...

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Bibliographic Details
Main Authors: Wang, Q., Yuan, Guanghui, Kiang, K. S., Sun, K., Gholipour, B., Rogers, E. T. F., Huang, K., Ang, S. S., Zheludev, Nikolay I., Teng, J. H.
Other Authors: School of Physical and Mathematical Sciences
Format: Article
Language:English
Published: 2019
Subjects:
Semiconductors
Femtosecond Lasers
DRNTU::Science::Physics
Online Access:https://hdl.handle.net/10356/81274
http://hdl.handle.net/10220/47486
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Institution: Nanyang Technological University
Language: English
Description
Summary:We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-change material photomask can be set to an arbitrary gray level with submicron lateral resolution, and the mask pattern can be optically reconfigured on demand, by inducing a refractive-index-changing phase-transition with femtosecond laser pulses. We show a spiral phase plate and a phase-type super-oscillatory lens fabricated on Si wafers to demonstrate the range of applications that can be addressed with this technique.

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