A computational design framework for two-layered elastic stamps in nanoimprint lithography and microcontact printing
Mechanical micro- and nano-patterning processes rely on engineering the interactions between a stamp and a substrate to accommodate surface roughness and particle defects while retaining the geometric integrity of printed features. We introduce a set of algorithms for rapidly simulating the stamp-su...
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Main Authors: | , |
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格式: | Article |
語言: | English |
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2019
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在線閱讀: | https://hdl.handle.net/10356/85324 http://hdl.handle.net/10220/48272 |
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機構: | Nanyang Technological University |
語言: | English |
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