EUV generation by plasmonic field enhancement using nanostructures
Plasmonic field enhancement using metal nanostructures is investigated to boost the peak intensity of the incident femtosecond laser by a factor of greater than 20 dB while retaining the original ultrashort pulse dynamics. This method enables extreme ultraviolet (EUV) light generation directly from...
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| Main Authors: | , , , |
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| 其他作者: | |
| 格式: | Conference or Workshop Item |
| 語言: | English |
| 出版: |
2018
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| 主題: | |
| 在線閱讀: | https://hdl.handle.net/10356/88584 http://hdl.handle.net/10220/46952 |
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| 機構: | Nanyang Technological University |
| 語言: | English |
| 總結: | Plasmonic field enhancement using metal nanostructures is investigated to boost the peak intensity of the incident femtosecond laser by a factor of greater than 20 dB while retaining the original ultrashort pulse dynamics. This method enables extreme ultraviolet (EUV) light generation directly from moderate femtosecond pulses of ~1 x 1011 W/cm2 intensities without auxiliary power amplification, demonstrating a possibility of achieving robust and reproducible EUV sources of the nano-scale for diverse EUV applications for microscopy, lithography and spectroscopy. |
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