EUV generation by plasmonic field enhancement using nanostructures

EUV generation by plasmonic field enhancement using nanostructures

Plasmonic field enhancement using metal nanostructures is investigated to boost the peak intensity of the incident femtosecond laser by a factor of greater than 20 dB while retaining the original ultrashort pulse dynamics. This method enables extreme ultraviolet (EUV) light generation directly from...

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Bibliographic Details
Main Authors: Han, Seunghwoi, Kim, Hyunwoong, Kim, Young-Jin, Kim, Seung-Woo
Other Authors: Asundi, Anand K.
Format: Conference or Workshop Item
Language:English
Published: 2018
Subjects:
EUV Light Source
DRNTU::Engineering::Mechanical engineering
Plasmonic Field Enhancement
Online Access:https://hdl.handle.net/10356/88584
http://hdl.handle.net/10220/46952
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Institution: Nanyang Technological University
Language: English
Description
Summary:Plasmonic field enhancement using metal nanostructures is investigated to boost the peak intensity of the incident femtosecond laser by a factor of greater than 20 dB while retaining the original ultrashort pulse dynamics. This method enables extreme ultraviolet (EUV) light generation directly from moderate femtosecond pulses of ~1 x 1011 W/cm2 intensities without auxiliary power amplification, demonstrating a possibility of achieving robust and reproducible EUV sources of the nano-scale for diverse EUV applications for microscopy, lithography and spectroscopy.

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