EUV generation by plasmonic field enhancement using nanostructures

• المؤلفون الرئيسيون: Han, Seunghwoi, Kim, Hyunwoong, Kim, Young-Jin, Kim, Seung-Woo
• مؤلفون آخرون: Asundi, Anand K.
• التنسيق: Conference or Workshop Item
• اللغة: English
• منشور في: 2018
• الموضوعات: EUV Light Source; DRNTU::Engineering::Mechanical engineering; Plasmonic Field Enhancement
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/88584; http://hdl.handle.net/10220/46952
• المؤسسة: Nanyang Technological University

Plasmonic field enhancement using metal nanostructures is investigated to boost the peak intensity of the incident femtosecond laser by a factor of greater than 20 dB while retaining the original ultrashort pulse dynamics. This method enables extreme ultraviolet (EUV) light generation directly from moderate femtosecond pulses of ~1 x 1011 W/cm2 intensities without auxiliary power amplification, demonstrating a possibility of achieving robust and reproducible EUV sources of the nano-scale for diverse EUV applications for microscopy, lithography and spectroscopy.