Fine electron biprism on a Si-on-insulator chip for off-axis electron holography

Fine electron biprism on a Si-on-insulator chip for off-axis electron holography

Off-axis electron holography allows both the amplitude and the phase shift of an electron wavefield propagating through a specimen in a transmission electron microscope to be recovered. The technique requires the use of an electron biprism to deflect an object wave and a reference wave to form an in...

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Bibliographic Details
Main Authors: Duchamp, Martial, Girard, Olivier, Pozzi, Giulio, Soltner, Helmut, Winkler, Florian, Speen, Rolf, Dunin-Borkowski, Rafal E., Cooper, David
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2019
Subjects:
Electron
Biprism
DRNTU::Engineering::Materials
Online Access:https://hdl.handle.net/10356/90287
http://hdl.handle.net/10220/48487
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Institution: Nanyang Technological University
Language: English
Description
Summary:Off-axis electron holography allows both the amplitude and the phase shift of an electron wavefield propagating through a specimen in a transmission electron microscope to be recovered. The technique requires the use of an electron biprism to deflect an object wave and a reference wave to form an interference pattern. Here, we introduce an approach based on semiconductor processing technology to fabricate fine electron biprisms with rectangular cross-sections. By performing electrostatic calculations and preliminary experiments, we demonstrate that such biprisms promise improved performance for electron holography experiments.

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