Fine electron biprism on a Si-on-insulator chip for off-axis electron holography

• Main Authors: Duchamp, Martial, Girard, Olivier, Pozzi, Giulio, Soltner, Helmut, Winkler, Florian, Speen, Rolf, Dunin-Borkowski, Rafal E., Cooper, David
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2019
• Subjects: Electron; Biprism; DRNTU::Engineering::Materials
• Online Access: https://hdl.handle.net/10356/90287; http://hdl.handle.net/10220/48487
• Institution: Nanyang Technological University

Off-axis electron holography allows both the amplitude and the phase shift of an electron wavefield propagating through a specimen in a transmission electron microscope to be recovered. The technique requires the use of an electron biprism to deflect an object wave and a reference wave to form an interference pattern. Here, we introduce an approach based on semiconductor processing technology to fabricate fine electron biprisms with rectangular cross-sections. By performing electrostatic calculations and preliminary experiments, we demonstrate that such biprisms promise improved performance for electron holography experiments.