Impact of programming mechanisms on the performance and reliability of nonvolatile memory devices based on Si nanocrystals

A nonvolatile memory based on silicon nanocrystals (nc-Si) synthesized with very-low-energy Si+ implantation is fabricated, and the memory performance under the programming/erasing of either Fowler-Nordheim (FN)/FN or channel hot electron (CHE)/FN at both room temperature and 85°C is investigated. T...

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Main Authors: Ng, Chi Yung, Chen, Tupei, Yang, Ming, Yang, Jian Bo, Ding, Liang, Li, Chang Ming, Du, A., Trigg, Alastair David
其他作者: School of Electrical and Electronic Engineering
格式: Article
語言:English
出版: 2010
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在線閱讀:https://hdl.handle.net/10356/90605
http://hdl.handle.net/10220/6427
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