Impact of programming mechanisms on the performance and reliability of nonvolatile memory devices based on Si nanocrystals
A nonvolatile memory based on silicon nanocrystals (nc-Si) synthesized with very-low-energy Si+ implantation is fabricated, and the memory performance under the programming/erasing of either Fowler-Nordheim (FN)/FN or channel hot electron (CHE)/FN at both room temperature and 85°C is investigated. T...
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Main Authors: | , , , , , , , |
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格式: | Article |
語言: | English |
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2010
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在線閱讀: | https://hdl.handle.net/10356/90605 http://hdl.handle.net/10220/6427 |
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