Influence of nanocrystal distribution on electroluminescence from Si+-implanted SiO2 thin films

Light emitting diodes (LEDs) based on a metal-oxide-semiconductor-like (MOS-like) structure with Si nanocrystals (nc-Si) embedded in SiO2 have been fabricated with low-energy ion implantation. Under a negative gate voltage as low as ~-5 V, both visible and infrared (IR) electroluminescence (EL) have...

全面介紹

Saved in:
書目詳細資料
Main Authors: Ding, Liang, Chen, Tupei, Yang, Ming, Zhu, Fu Rong
其他作者: School of Electrical and Electronic Engineering
格式: Conference or Workshop Item
語言:English
出版: 2011
主題:
在線閱讀:https://hdl.handle.net/10356/93791
http://hdl.handle.net/10220/6939
標簽: 添加標簽
沒有標簽, 成為第一個標記此記錄!
機構: Nanyang Technological University
語言: English