Influence of nanocrystal distribution on electroluminescence from Si+-implanted SiO2 thin films
Light emitting diodes (LEDs) based on a metal-oxide-semiconductor-like (MOS-like) structure with Si nanocrystals (nc-Si) embedded in SiO2 have been fabricated with low-energy ion implantation. Under a negative gate voltage as low as ~-5 V, both visible and infrared (IR) electroluminescence (EL) have...
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Main Authors: | , , , |
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格式: | Conference or Workshop Item |
語言: | English |
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2011
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在線閱讀: | https://hdl.handle.net/10356/93791 http://hdl.handle.net/10220/6939 |
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機構: | Nanyang Technological University |
語言: | English |
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