Textured Ni(Pt) germanosilicide formation on a condensed Si1-xGex/Si substrate

A study of Ni and Ni(Pt) germanosilicidation on a condensed Si1−xGex/Si substrate was performed. The partial relaxation of the condensed SiGe layer resulted in an improvement in the morphological stability of the germanosilicide through the alleviation of compressive stress. Pt alloying to th...

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Bibliographic Details
Main Authors: Setiawan, Y., Balakumar, S., Tan, Eu Jin, Pey, Kin Leong, Lee, Pooi See
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2012
Subjects:
Online Access:https://hdl.handle.net/10356/95013
http://hdl.handle.net/10220/8004
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Institution: Nanyang Technological University
Language: English
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