Non-ablative texturing of silicon surface with a continuous wave fiber laser
Laser surface texturing based on ablation has been widely used, but hardly any reports can be found on non-ablative laser surface texturing. Silicon is highly transparent to the infrared wavelength of fiber laser (λ = 1090 nm) and thus regarded as an unsuitable tool for the purpose of surface textur...
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| Main Authors: | , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | English |
| Published: |
2013
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| Online Access: | https://hdl.handle.net/10356/95142 http://hdl.handle.net/10220/9310 |
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| Institution: | Nanyang Technological University |
| Language: | English |
| Summary: | Laser surface texturing based on ablation has been widely used, but hardly any reports can be found on non-ablative laser surface texturing. Silicon is highly transparent to the infrared wavelength of fiber laser (λ = 1090 nm) and thus regarded as an unsuitable tool for the purpose of surface texturing. However, we succeeded in using a continuous wave fiber laser to produce regular arrays of sub-micron bumps on silicon surface. The approach is shown to be based on laser-induced oxidation of silicon. |
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