Probing carboxylic acid groups in replaced and mixed self-assembled monolayers by individual ionized dendrimer molecules :  an atomic force microscopy study

Polyphenylene dendrimer molecules, G2Td(COOH)16, were ionized (G2 ions) and then adsorbed on a carboxylic acid (COOH) group terminated self-assembled monolayer (SAM) on a Au substrate through the linkage with Cu2+ ions. The individual G2 ions were observed by noncontact atomic force microscopy (NCAF...

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Main Authors: Wiesler, U. M., Grim, P. C. M., Vosch, T., Berresheim, A. J., Müllen, K., Van Haesendonck, C., Vandamme, N., De Schryver, F. C., Zhang, Hua, Liu, Daojun, De Feyter, Steven
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2012
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Online Access:https://hdl.handle.net/10356/95392
http://hdl.handle.net/10220/8549
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-953922020-06-01T10:21:20Z Probing carboxylic acid groups in replaced and mixed self-assembled monolayers by individual ionized dendrimer molecules :  an atomic force microscopy study Wiesler, U. M. Grim, P. C. M. Vosch, T. Berresheim, A. J. Müllen, K. Van Haesendonck, C. Vandamme, N. De Schryver, F. C. Zhang, Hua Liu, Daojun De Feyter, Steven School of Materials Science & Engineering DRNTU::Engineering::Materials Polyphenylene dendrimer molecules, G2Td(COOH)16, were ionized (G2 ions) and then adsorbed on a carboxylic acid (COOH) group terminated self-assembled monolayer (SAM) on a Au substrate through the linkage with Cu2+ ions. The individual G2 ions were observed by noncontact atomic force microscopy (NCAFM). The strong interaction between the G2 and Cu2+ ions, the latter of which are preadsorbed on the COOH SAM, led to a compression or deformation of the SAM and resulted in a decreased height of the G2 ions measured by NCAFM as compared to a theoretical model of the dendrimer molecules. The present method offers an approach to bind dendrimer molecules to a solid substrate and to study the nanoscale behavior of two kinds of thiol molecules in replaced and mixed SAMs. 2012-09-14T06:37:12Z 2019-12-06T19:13:58Z 2012-09-14T06:37:12Z 2019-12-06T19:13:58Z 2002 2002 Journal Article Zhang, H., Grim, P. C. M., Liu, D., Vosch, T., De Feyter, S., Wiesler, U. M., et al. (2002). Probing carboxylic acid groups in replaced and mixed self-assembled monolayers by individual ionized dendrimer molecules :  an atomic force microscopy study. Langmuir, 18(5), 1801-1810. 0743-7463 https://hdl.handle.net/10356/95392 http://hdl.handle.net/10220/8549 10.1021/la011061t en Langmuir © 2002 American Chemical Society.
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
topic DRNTU::Engineering::Materials
spellingShingle DRNTU::Engineering::Materials
Wiesler, U. M.
Grim, P. C. M.
Vosch, T.
Berresheim, A. J.
Müllen, K.
Van Haesendonck, C.
Vandamme, N.
De Schryver, F. C.
Zhang, Hua
Liu, Daojun
De Feyter, Steven
Probing carboxylic acid groups in replaced and mixed self-assembled monolayers by individual ionized dendrimer molecules :  an atomic force microscopy study
description Polyphenylene dendrimer molecules, G2Td(COOH)16, were ionized (G2 ions) and then adsorbed on a carboxylic acid (COOH) group terminated self-assembled monolayer (SAM) on a Au substrate through the linkage with Cu2+ ions. The individual G2 ions were observed by noncontact atomic force microscopy (NCAFM). The strong interaction between the G2 and Cu2+ ions, the latter of which are preadsorbed on the COOH SAM, led to a compression or deformation of the SAM and resulted in a decreased height of the G2 ions measured by NCAFM as compared to a theoretical model of the dendrimer molecules. The present method offers an approach to bind dendrimer molecules to a solid substrate and to study the nanoscale behavior of two kinds of thiol molecules in replaced and mixed SAMs.
author2 School of Materials Science & Engineering
author_facet School of Materials Science & Engineering
Wiesler, U. M.
Grim, P. C. M.
Vosch, T.
Berresheim, A. J.
Müllen, K.
Van Haesendonck, C.
Vandamme, N.
De Schryver, F. C.
Zhang, Hua
Liu, Daojun
De Feyter, Steven
format Article
author Wiesler, U. M.
Grim, P. C. M.
Vosch, T.
Berresheim, A. J.
Müllen, K.
Van Haesendonck, C.
Vandamme, N.
De Schryver, F. C.
Zhang, Hua
Liu, Daojun
De Feyter, Steven
author_sort Wiesler, U. M.
title Probing carboxylic acid groups in replaced and mixed self-assembled monolayers by individual ionized dendrimer molecules :  an atomic force microscopy study
title_short Probing carboxylic acid groups in replaced and mixed self-assembled monolayers by individual ionized dendrimer molecules :  an atomic force microscopy study
title_full Probing carboxylic acid groups in replaced and mixed self-assembled monolayers by individual ionized dendrimer molecules :  an atomic force microscopy study
title_fullStr Probing carboxylic acid groups in replaced and mixed self-assembled monolayers by individual ionized dendrimer molecules :  an atomic force microscopy study
title_full_unstemmed Probing carboxylic acid groups in replaced and mixed self-assembled monolayers by individual ionized dendrimer molecules :  an atomic force microscopy study
title_sort probing carboxylic acid groups in replaced and mixed self-assembled monolayers by individual ionized dendrimer molecules :  an atomic force microscopy study
publishDate 2012
url https://hdl.handle.net/10356/95392
http://hdl.handle.net/10220/8549
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