Dip-pen nanolithography-generated patterns used as gold etch resists : a comparison study of 16-mercaptohexadecanioc acid and 1-octadecanethiol

The etch resist ability of dip-pen nanolithography (DPN)-generated dot patterns of different alkanethiols on Au was systematically studied. After 16-mercaptohexadecanioc acid (MHA) and 1-octadecanethiol (ODT) dots with different diameters were patterned on a Au substrate by DPN, the substrate was et...

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Bibliographic Details
Main Authors: Lu, Gang, Chen, Yanhong, Li, Bing, Zhou, Xiaozhu, Xue, Can, Ma, Jan, Boey, Freddy Yin Chiang, Zhang, Hua
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2012
Subjects:
Online Access:https://hdl.handle.net/10356/95587
http://hdl.handle.net/10220/8602
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Institution: Nanyang Technological University
Language: English