Dip-pen nanolithography-generated patterns used as gold etch resists : a comparison study of 16-mercaptohexadecanioc acid and 1-octadecanethiol

• Main Authors: Lu, Gang, Chen, Yanhong, Li, Bing, Zhou, Xiaozhu, Xue, Can, Ma, Jan, Boey, Freddy Yin Chiang, Zhang, Hua
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2012
• Subjects: DRNTU::Engineering::Materials
• Online Access: https://hdl.handle.net/10356/95587; http://hdl.handle.net/10220/8602
• Institution: Nanyang Technological University

The etch resist ability of dip-pen nanolithography (DPN)-generated dot patterns of different alkanethiols on Au was systematically studied. After 16-mercaptohexadecanioc acid (MHA) and 1-octadecanethiol (ODT) dots with different diameters were patterned on a Au substrate by DPN, the substrate was et...