Dip-pen nanolithography-generated patterns used as gold etch resists : a comparison study of 16-mercaptohexadecanioc acid and 1-octadecanethiol

• Main Authors: Lu, Gang, Chen, Yanhong, Li, Bing, Zhou, Xiaozhu, Xue, Can, Ma, Jan, Boey, Freddy Yin Chiang, Zhang, Hua
• 其他作者: School of Materials Science & Engineering
• 格式: Article
• 語言: English
• 出版: 2012
• 主題: DRNTU::Engineering::Materials
• 在線閱讀: https://hdl.handle.net/10356/95587; http://hdl.handle.net/10220/8602

The etch resist ability of dip-pen nanolithography (DPN)-generated dot patterns of different alkanethiols on Au was systematically studied. After 16-mercaptohexadecanioc acid (MHA) and 1-octadecanethiol (ODT) dots with different diameters were patterned on a Au substrate by DPN, the substrate was et...