An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering

An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering

Ni films were deposited by magnetron sputtering with a relatively high deposition rate (0.5 nm/s). We have investigated the structure and magnetic properties of Ni films with different thicknesses. Strongly reduced magnetization has been found in the as-deposited Ni film. Our structural investigatio...

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Bibliographic Details
Main Authors: Yi, J. B., Zhou, Y. Z., Wee, A. T. S., Yu, X. J., Ding, Jun, Chow, Gan Moog, Dong, Zhili, White, Timothy John, Gao, Xing Yu
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2012
Subjects:
DRNTU::Engineering::Materials
Online Access:https://hdl.handle.net/10356/95672
http://hdl.handle.net/10220/8288
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Institution: Nanyang Technological University
Language: English
Description
Summary:Ni films were deposited by magnetron sputtering with a relatively high deposition rate (0.5 nm/s). We have investigated the structure and magnetic properties of Ni films with different thicknesses. Strongly reduced magnetization has been found in the as-deposited Ni film. Our structural investigation (high-resolution TEM, EXAFS) reveals the presence of amorphous structure. The crystallinity increases with increasing film thickness, accompanied by an increase of magnetization. In 15 nm film or below, circular crystallites were found after annealing at 500 °C. Anisotropic magnetoresistance (AMR) has been observed and it is strongly dependent on the microstructure.

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