An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering

• Main Authors: Yi, J. B., Zhou, Y. Z., Wee, A. T. S., Yu, X. J., Ding, Jun, Chow, Gan Moog, Dong, Zhili, White, Timothy John, Gao, Xing Yu
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2012
• Subjects: DRNTU::Engineering::Materials
• Online Access: https://hdl.handle.net/10356/95672; http://hdl.handle.net/10220/8288
• Institution: Nanyang Technological University

Ni films were deposited by magnetron sputtering with a relatively high deposition rate (0.5 nm/s). We have investigated the structure and magnetic properties of Ni films with different thicknesses. Strongly reduced magnetization has been found in the as-deposited Ni film. Our structural investigatio...