In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400°C

In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400°C

The key feature of this paper is to highlight the use of an in situ XRD technique to the study of the initial reaction of Ni(Pt) on Si(100) isothermally. The concentration of Ni and Pt as a function of time in the low temperature range of less than 400 °C was evaluated. The XRD results show that the...

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Main Authors: Mangelinck, D., Chan, L., Lee, Pooi See, Pey, Kin Leong, Ding, Jun
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2013
Subjects:
DRNTU::Engineering::Electrical and electronic engineering
Online Access:https://hdl.handle.net/10356/97334
http://hdl.handle.net/10220/10506
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-973342020-03-07T14:02:47Z In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400°C Mangelinck, D. Chan, L. Lee, Pooi See Pey, Kin Leong Ding, Jun School of Electrical and Electronic Engineering Microelectronics Centre DRNTU::Engineering::Electrical and electronic engineering The key feature of this paper is to highlight the use of an in situ XRD technique to the study of the initial reaction of Ni(Pt) on Si(100) isothermally. The concentration of Ni and Pt as a function of time in the low temperature range of less than 400 °C was evaluated. The XRD results show that the solid state reaction started with a outdiffusion of Ni from the Ni(Pt) alloy during the formation of Ni2Si prior to the formation of Ni(Pt)Si. This in situ technique is important for the characterization and the study of the nucleation and kinetics of the first phase formation of advanced alloy silicides. 2013-06-20T03:21:27Z 2019-12-06T19:41:36Z 2013-06-20T03:21:27Z 2019-12-06T19:41:36Z 2003 2003 Journal Article Lee, P. S., Pey, K. L., Mangelinck, D., Ding, J., & Chan, L. (2003). In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400°C. Solid State Communications, 128(9-10), 325-328. 0038-1098 https://hdl.handle.net/10356/97334 http://hdl.handle.net/10220/10506 10.1016/j.ssc.2003.09.004 en Solid state communications © 2003 Elsevier Ltd.
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
topic DRNTU::Engineering::Electrical and electronic engineering
spellingShingle DRNTU::Engineering::Electrical and electronic engineering
Mangelinck, D.
Chan, L.
Lee, Pooi See
Pey, Kin Leong
Ding, Jun
In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400°C
description The key feature of this paper is to highlight the use of an in situ XRD technique to the study of the initial reaction of Ni(Pt) on Si(100) isothermally. The concentration of Ni and Pt as a function of time in the low temperature range of less than 400 °C was evaluated. The XRD results show that the solid state reaction started with a outdiffusion of Ni from the Ni(Pt) alloy during the formation of Ni2Si prior to the formation of Ni(Pt)Si. This in situ technique is important for the characterization and the study of the nucleation and kinetics of the first phase formation of advanced alloy silicides.
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Mangelinck, D.
Chan, L.
Lee, Pooi See
Pey, Kin Leong
Ding, Jun
format Article
author Mangelinck, D.
Chan, L.
Lee, Pooi See
Pey, Kin Leong
Ding, Jun
author_sort Mangelinck, D.
title In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400°C
title_short In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400°C
title_full In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400°C
title_fullStr In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400°C
title_full_unstemmed In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400°C
title_sort in situ xrd analysis of ni(pt)/si(100) reactions in low temperature regime ≤400°c
publishDate 2013
url https://hdl.handle.net/10356/97334
http://hdl.handle.net/10220/10506
_version_ 1681039304088879104

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