Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching
A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures...
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sg-ntu-dr.10356-975122020-06-01T10:13:57Z Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching Amro, Nabil A. Zhang, Hua Disawal, Sandeep Elghanian, Robert Shile, Roger Fragala, Joseph School of Materials Science & Engineering DRNTU::Engineering::Materials A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications. 2013-06-21T01:23:09Z 2019-12-06T19:43:27Z 2013-06-21T01:23:09Z 2019-12-06T19:43:27Z 2006 2006 Journal Article Zhang, H., Amro, N. A., Disawal, S., Elghanian, R., Shile, R., & Fragala, J. (2006). Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching. Applied Surface Science, 253(4), 1960-1963. 0169-4332 https://hdl.handle.net/10356/97512 http://hdl.handle.net/10220/10516 10.1016/j.apsusc.2006.03.045 en Applied surface science © 2006 Elsevier B.V. |
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DRNTU::Engineering::Materials Amro, Nabil A. Zhang, Hua Disawal, Sandeep Elghanian, Robert Shile, Roger Fragala, Joseph Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching |
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A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications. |
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School of Materials Science & Engineering |
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School of Materials Science & Engineering Amro, Nabil A. Zhang, Hua Disawal, Sandeep Elghanian, Robert Shile, Roger Fragala, Joseph |
format |
Article |
author |
Amro, Nabil A. Zhang, Hua Disawal, Sandeep Elghanian, Robert Shile, Roger Fragala, Joseph |
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Amro, Nabil A. |
title |
Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching |
title_short |
Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching |
title_full |
Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching |
title_fullStr |
Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching |
title_full_unstemmed |
Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching |
title_sort |
microstructure array on si and siox generated by micro-contact printing, wet chemical etching and reactive ion etching |
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2013 |
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https://hdl.handle.net/10356/97512 http://hdl.handle.net/10220/10516 |
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1681059295270010880 |