Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD

Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD

Deposition of titanium carbide (TiC) layer on titanium (Ti) surface has been demonstrated by an ion-enhanced triode plasma chemical vapor deposition (CVD) method using a TiCl4 + CH4 + H2 gas mixture. Physical and mechanical properties of the deposited TiC film on Ti were investigated to examine its...

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Bibliographic Details
Main Authors: Zhu, Yuhe, Wang, Wei, Jia, Xingya, Akasaka, Tsukasa, Liao, Susan, Watari, Fumio
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2013
Online Access:https://hdl.handle.net/10356/99245
http://hdl.handle.net/10220/11022
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Institution: Nanyang Technological University
Language: English

Internet

https://hdl.handle.net/10356/99245
http://hdl.handle.net/10220/11022

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