Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD
Deposition of titanium carbide (TiC) layer on titanium (Ti) surface has been demonstrated by an ion-enhanced triode plasma chemical vapor deposition (CVD) method using a TiCl4 + CH4 + H2 gas mixture. Physical and mechanical properties of the deposited TiC film on Ti were investigated to examine its...
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sg-ntu-dr.10356-992452020-06-01T10:01:47Z Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD Zhu, Yuhe Wang, Wei Jia, Xingya Akasaka, Tsukasa Liao, Susan Watari, Fumio School of Materials Science & Engineering Deposition of titanium carbide (TiC) layer on titanium (Ti) surface has been demonstrated by an ion-enhanced triode plasma chemical vapor deposition (CVD) method using a TiCl4 + CH4 + H2 gas mixture. Physical and mechanical properties of the deposited TiC film on Ti were investigated to examine its potential application as an abrasion resistant implant material. X-ray diffraction (XRD) showed that the specimen was consisted of TiC and Ti. Carbide layer of about 6 μm thickness was observed on the cross section of the specimen by scanning electron microscopy (SEM). The Vickers hardness of surface carbide was more than 2000, which confirmed its high abrasion resistance. 2013-07-09T01:12:52Z 2019-12-06T20:05:01Z 2013-07-09T01:12:52Z 2019-12-06T20:05:01Z 2012 2012 Journal Article Zhu, Y., Wang, W., Jia, X., Akasaka, T., Liao, S., & Watari, F. (2012). Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD. Applied Surface Science, 262, 156-158. 0169-4332 https://hdl.handle.net/10356/99245 http://hdl.handle.net/10220/11022 10.1016/j.apsusc.2012.03.152 en Applied surface science © 2012 Elsevier B.V. |
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Deposition of titanium carbide (TiC) layer on titanium (Ti) surface has been demonstrated by an ion-enhanced triode plasma chemical vapor deposition (CVD) method using a TiCl4 + CH4 + H2 gas mixture. Physical and mechanical properties of the deposited TiC film on Ti were investigated to examine its potential application as an abrasion resistant implant material. X-ray diffraction (XRD) showed that the specimen was consisted of TiC and Ti. Carbide layer of about 6 μm thickness was observed on the cross section of the specimen by scanning electron microscopy (SEM). The Vickers hardness of surface carbide was more than 2000, which confirmed its high abrasion resistance. |
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School of Materials Science & Engineering |
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School of Materials Science & Engineering Zhu, Yuhe Wang, Wei Jia, Xingya Akasaka, Tsukasa Liao, Susan Watari, Fumio |
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Article |
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Zhu, Yuhe Wang, Wei Jia, Xingya Akasaka, Tsukasa Liao, Susan Watari, Fumio |
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Zhu, Yuhe Wang, Wei Jia, Xingya Akasaka, Tsukasa Liao, Susan Watari, Fumio Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD |
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Zhu, Yuhe |
title |
Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD |
title_short |
Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD |
title_full |
Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD |
title_fullStr |
Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD |
title_full_unstemmed |
Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD |
title_sort |
deposition of tic film on titanium for abrasion resistant implant material by ion-enhanced triode plasma cvd |
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2013 |
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https://hdl.handle.net/10356/99245 http://hdl.handle.net/10220/11022 |
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1681056780956729344 |