Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD

Deposition of titanium carbide (TiC) layer on titanium (Ti) surface has been demonstrated by an ion-enhanced triode plasma chemical vapor deposition (CVD) method using a TiCl4 + CH4 + H2 gas mixture. Physical and mechanical properties of the deposited TiC film on Ti were investigated to examine its...

Full description

Saved in:
Bibliographic Details
Main Authors: Zhu, Yuhe, Wang, Wei, Jia, Xingya, Akasaka, Tsukasa, Liao, Susan, Watari, Fumio
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2013
Online Access:https://hdl.handle.net/10356/99245
http://hdl.handle.net/10220/11022
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English
id sg-ntu-dr.10356-99245
record_format dspace
spelling sg-ntu-dr.10356-992452020-06-01T10:01:47Z Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD Zhu, Yuhe Wang, Wei Jia, Xingya Akasaka, Tsukasa Liao, Susan Watari, Fumio School of Materials Science & Engineering Deposition of titanium carbide (TiC) layer on titanium (Ti) surface has been demonstrated by an ion-enhanced triode plasma chemical vapor deposition (CVD) method using a TiCl4 + CH4 + H2 gas mixture. Physical and mechanical properties of the deposited TiC film on Ti were investigated to examine its potential application as an abrasion resistant implant material. X-ray diffraction (XRD) showed that the specimen was consisted of TiC and Ti. Carbide layer of about 6 μm thickness was observed on the cross section of the specimen by scanning electron microscopy (SEM). The Vickers hardness of surface carbide was more than 2000, which confirmed its high abrasion resistance. 2013-07-09T01:12:52Z 2019-12-06T20:05:01Z 2013-07-09T01:12:52Z 2019-12-06T20:05:01Z 2012 2012 Journal Article Zhu, Y., Wang, W., Jia, X., Akasaka, T., Liao, S., & Watari, F. (2012). Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD. Applied Surface Science, 262, 156-158. 0169-4332 https://hdl.handle.net/10356/99245 http://hdl.handle.net/10220/11022 10.1016/j.apsusc.2012.03.152 en Applied surface science © 2012 Elsevier B.V.
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
description Deposition of titanium carbide (TiC) layer on titanium (Ti) surface has been demonstrated by an ion-enhanced triode plasma chemical vapor deposition (CVD) method using a TiCl4 + CH4 + H2 gas mixture. Physical and mechanical properties of the deposited TiC film on Ti were investigated to examine its potential application as an abrasion resistant implant material. X-ray diffraction (XRD) showed that the specimen was consisted of TiC and Ti. Carbide layer of about 6 μm thickness was observed on the cross section of the specimen by scanning electron microscopy (SEM). The Vickers hardness of surface carbide was more than 2000, which confirmed its high abrasion resistance.
author2 School of Materials Science & Engineering
author_facet School of Materials Science & Engineering
Zhu, Yuhe
Wang, Wei
Jia, Xingya
Akasaka, Tsukasa
Liao, Susan
Watari, Fumio
format Article
author Zhu, Yuhe
Wang, Wei
Jia, Xingya
Akasaka, Tsukasa
Liao, Susan
Watari, Fumio
spellingShingle Zhu, Yuhe
Wang, Wei
Jia, Xingya
Akasaka, Tsukasa
Liao, Susan
Watari, Fumio
Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD
author_sort Zhu, Yuhe
title Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD
title_short Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD
title_full Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD
title_fullStr Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD
title_full_unstemmed Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD
title_sort deposition of tic film on titanium for abrasion resistant implant material by ion-enhanced triode plasma cvd
publishDate 2013
url https://hdl.handle.net/10356/99245
http://hdl.handle.net/10220/11022
_version_ 1681056780956729344