Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD

• المؤلفون الرئيسيون: Zhu, Yuhe, Wang, Wei, Jia, Xingya, Akasaka, Tsukasa, Liao, Susan, Watari, Fumio
• مؤلفون آخرون: School of Materials Science & Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2013
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/99245; http://hdl.handle.net/10220/11022
• المؤسسة: Nanyang Technological University

Deposition of titanium carbide (TiC) layer on titanium (Ti) surface has been demonstrated by an ion-enhanced triode plasma chemical vapor deposition (CVD) method using a TiCl4 + CH4 + H2 gas mixture. Physical and mechanical properties of the deposited TiC film on Ti were investigated to examine its...