Nanocrystalline p-type transparent Cu-Al-O semiconductor prepared by chemical-vapor deposition with Cu(acac)2 and Al(acac)3 precursors

Applied Physics Letters

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Main Authors:	Gong, H., Wang, Y., Luo, Y.
Other Authors:	MATERIALS SCIENCE
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/107138
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-1071382015-01-14T01:39:11Z Nanocrystalline p-type transparent Cu-Al-O semiconductor prepared by chemical-vapor deposition with Cu(acac)2 and Al(acac)3 precursors Gong, H. Wang, Y. Luo, Y. MATERIALS SCIENCE Applied Physics Letters 76 26 3959-3961 APPLA 2014-10-29T08:39:58Z 2014-10-29T08:39:58Z 2000-06-26 Article Gong, H.,Wang, Y.,Luo, Y. (2000-06-26). Nanocrystalline p-type transparent Cu-Al-O semiconductor prepared by chemical-vapor deposition with Cu(acac)2 and Al(acac)3 precursors. Applied Physics Letters 76 (26) : 3959-3961. ScholarBank@NUS Repository. 00036951 http://scholarbank.nus.edu.sg/handle/10635/107138 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Applied Physics Letters
author2	MATERIALS SCIENCE
author_facet	MATERIALS SCIENCE Gong, H. Wang, Y. Luo, Y.
format	Article
author	Gong, H. Wang, Y. Luo, Y.
spellingShingle	Gong, H. Wang, Y. Luo, Y. Nanocrystalline p-type transparent Cu-Al-O semiconductor prepared by chemical-vapor deposition with Cu(acac)2 and Al(acac)3 precursors
author_sort	Gong, H.
title	Nanocrystalline p-type transparent Cu-Al-O semiconductor prepared by chemical-vapor deposition with Cu(acac)2 and Al(acac)3 precursors
title_short	Nanocrystalline p-type transparent Cu-Al-O semiconductor prepared by chemical-vapor deposition with Cu(acac)2 and Al(acac)3 precursors
title_full	Nanocrystalline p-type transparent Cu-Al-O semiconductor prepared by chemical-vapor deposition with Cu(acac)2 and Al(acac)3 precursors
title_fullStr	Nanocrystalline p-type transparent Cu-Al-O semiconductor prepared by chemical-vapor deposition with Cu(acac)2 and Al(acac)3 precursors
title_full_unstemmed	Nanocrystalline p-type transparent Cu-Al-O semiconductor prepared by chemical-vapor deposition with Cu(acac)2 and Al(acac)3 precursors
title_sort	nanocrystalline p-type transparent cu-al-o semiconductor prepared by chemical-vapor deposition with cu(acac)2 and al(acac)3 precursors
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/107138
_version_	1681093590527246336

Nanocrystalline p-type transparent Cu-Al-O semiconductor prepared by chemical-vapor deposition with Cu(acac)2 and Al(acac)3 precursors

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