Mechanical properties of Cu-Al-O thin films prepared by plasma-enhanced chemical vapor deposition

10.1116/1.2191860

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Bibliographic Details
Main Authors: Chen, W., Gong, H., Zeng, K.
Other Authors: MATERIALS SCIENCE AND ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/86526
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Institution: National University of Singapore