Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition

Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition

10.1063/1.1829789

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Bibliographic Details
Main Authors: Chen, X.Y., Lu, Y.F., Tang, L.J., Wu, Y.H., Cho, B.J., Xu, X.J., Dong, J.R., Song, W.D.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55119
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/55119

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