Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition

10.1063/1.1829789

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Bibliographic Details
Main Authors:	Chen, X.Y., Lu, Y.F., Tang, L.J., Wu, Y.H., Cho, B.J., Xu, X.J., Dong, J.R., Song, W.D.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/55119
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-551192023-10-30T21:46:37Z Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition Chen, X.Y. Lu, Y.F. Tang, L.J. Wu, Y.H. Cho, B.J. Xu, X.J. Dong, J.R. Song, W.D. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.1829789 Journal of Applied Physics 97 1 - JAPIA 2014-06-17T02:39:24Z 2014-06-17T02:39:24Z 2005-01-01 Article Chen, X.Y., Lu, Y.F., Tang, L.J., Wu, Y.H., Cho, B.J., Xu, X.J., Dong, J.R., Song, W.D. (2005-01-01). Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition. Journal of Applied Physics 97 (1) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1829789 00218979 http://scholarbank.nus.edu.sg/handle/10635/55119 000226700300101 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.1829789
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Chen, X.Y. Lu, Y.F. Tang, L.J. Wu, Y.H. Cho, B.J. Xu, X.J. Dong, J.R. Song, W.D.
format	Article
author	Chen, X.Y. Lu, Y.F. Tang, L.J. Wu, Y.H. Cho, B.J. Xu, X.J. Dong, J.R. Song, W.D.
spellingShingle	Chen, X.Y. Lu, Y.F. Tang, L.J. Wu, Y.H. Cho, B.J. Xu, X.J. Dong, J.R. Song, W.D. Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition
author_sort	Chen, X.Y.
title	Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition
title_short	Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition
title_full	Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition
title_fullStr	Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition
title_full_unstemmed	Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition
title_sort	annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/55119
_version_	1781412075249074176

Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition

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