Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition
10.1063/1.1829789
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Main Authors: | Chen, X.Y., Lu, Y.F., Tang, L.J., Wu, Y.H., Cho, B.J., Xu, X.J., Dong, J.R., Song, W.D. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/55119 |
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Institution: | National University of Singapore |
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