Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition

• Main Authors: Chen, X.Y., Lu, Y.F., Tang, L.J., Wu, Y.H., Cho, B.J., Xu, X.J., Dong, J.R., Song, W.D.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/55119
• Institution: National University of Singapore

10.1063/1.1829789