Two coexisting modes in field-assisted AFM nanopatterning of thin polymer films

10.1002/macp.200800074

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Bibliographic Details
Main Authors:	Xie, X.N., Chung, H.J., Bandyopadhyay, D., Sharma, A., Sow, C.H., Bettiol, A.A., Wee, A.T.S.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Subjects:	Atomic force microscopy (AFM) Films Lithography Microstructure
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/112660
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Institution:	National University of Singapore

Description
Summary:	10.1002/macp.200800074

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