Probing the behaviour of ultra thin Co layers on clean and hydrogen terminated Si(0 0 1) and Si(1 1 1) surfaces

Probing the behaviour of ultra thin Co layers on clean and hydrogen terminated Si(0 0 1) and Si(1 1 1) surfaces

10.1016/S0039-6028(03)00149-3

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Bibliographic Details
Main Authors: Pan, J.S., Tok, E.S., Huan, C.H.A., Liu, R.S., Chai, J.W., Ong, W.J., Toh, K.C.
Other Authors: MATERIALS SCIENCE
Format: Conference or Workshop Item
Published: 2014
Subjects:
Atomic force microscopy
Cobalt
Diffusion and migration
Silicides
X-ray photoelectron spectroscopy
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113116
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Institution: National University of Singapore
Description
Summary:10.1016/S0039-6028(03)00149-3

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