Probing the behaviour of ultra thin Co layers on clean and hydrogen terminated Si(0 0 1) and Si(1 1 1) surfaces

10.1016/S0039-6028(03)00149-3

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Bibliographic Details
Main Authors:	Pan, J.S., Tok, E.S., Huan, C.H.A., Liu, R.S., Chai, J.W., Ong, W.J., Toh, K.C.
Other Authors:	MATERIALS SCIENCE
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Atomic force microscopy Cobalt Diffusion and migration Silicides X-ray photoelectron spectroscopy
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/113116
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-113116
record_format	dspace
spelling	sg-nus-scholar.10635-1131162023-10-26T21:02:19Z Probing the behaviour of ultra thin Co layers on clean and hydrogen terminated Si(0 0 1) and Si(1 1 1) surfaces Pan, J.S. Tok, E.S. Huan, C.H.A. Liu, R.S. Chai, J.W. Ong, W.J. Toh, K.C. MATERIALS SCIENCE INSTITUTE OF ENGINEERING SCIENCE PHYSICS Atomic force microscopy Cobalt Diffusion and migration Silicides X-ray photoelectron spectroscopy 10.1016/S0039-6028(03)00149-3 Surface Science 532-535 639-644 SUSCA 2014-11-28T09:12:13Z 2014-11-28T09:12:13Z 2003-06-10 Conference Paper Pan, J.S., Tok, E.S., Huan, C.H.A., Liu, R.S., Chai, J.W., Ong, W.J., Toh, K.C. (2003-06-10). Probing the behaviour of ultra thin Co layers on clean and hydrogen terminated Si(0 0 1) and Si(1 1 1) surfaces. Surface Science 532-535 : 639-644. ScholarBank@NUS Repository. https://doi.org/10.1016/S0039-6028(03)00149-3 00396028 http://scholarbank.nus.edu.sg/handle/10635/113116 000183705900109 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Atomic force microscopy Cobalt Diffusion and migration Silicides X-ray photoelectron spectroscopy
spellingShingle	Atomic force microscopy Cobalt Diffusion and migration Silicides X-ray photoelectron spectroscopy Pan, J.S. Tok, E.S. Huan, C.H.A. Liu, R.S. Chai, J.W. Ong, W.J. Toh, K.C. Probing the behaviour of ultra thin Co layers on clean and hydrogen terminated Si(0 0 1) and Si(1 1 1) surfaces
description	10.1016/S0039-6028(03)00149-3
author2	MATERIALS SCIENCE
author_facet	MATERIALS SCIENCE Pan, J.S. Tok, E.S. Huan, C.H.A. Liu, R.S. Chai, J.W. Ong, W.J. Toh, K.C.
format	Conference or Workshop Item
author	Pan, J.S. Tok, E.S. Huan, C.H.A. Liu, R.S. Chai, J.W. Ong, W.J. Toh, K.C.
author_sort	Pan, J.S.
title	Probing the behaviour of ultra thin Co layers on clean and hydrogen terminated Si(0 0 1) and Si(1 1 1) surfaces
title_short	Probing the behaviour of ultra thin Co layers on clean and hydrogen terminated Si(0 0 1) and Si(1 1 1) surfaces
title_full	Probing the behaviour of ultra thin Co layers on clean and hydrogen terminated Si(0 0 1) and Si(1 1 1) surfaces
title_fullStr	Probing the behaviour of ultra thin Co layers on clean and hydrogen terminated Si(0 0 1) and Si(1 1 1) surfaces
title_full_unstemmed	Probing the behaviour of ultra thin Co layers on clean and hydrogen terminated Si(0 0 1) and Si(1 1 1) surfaces
title_sort	probing the behaviour of ultra thin co layers on clean and hydrogen terminated si(0 0 1) and si(1 1 1) surfaces
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/113116
_version_	1781789169086889984

Probing the behaviour of ultra thin Co layers on clean and hydrogen terminated Si(0 0 1) and Si(1 1 1) surfaces

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