Reactive atom beam deposition of boron nitride ultrathin films and nanoparticles using borazine

Reactive atom beam deposition of boron nitride ultrathin films and nanoparticles using borazine

10.1016/S0925-9635(03)00025-6

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Bibliographic Details
Main Authors: Loh, K.P., Fan, W.Y., Lim, C.W., Zhang, X., Chen, W., Xie, X.N., Xu, H., Wee, A.T.S.
Other Authors: CHEMISTRY
Format: Article
Published: 2014
Subjects:
Boron nitride
Chemical vapor deposition
Nanotubes
Radio-frequency plasma
Online Access:http://scholarbank.nus.edu.sg/handle/10635/115258
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Institution: National University of Singapore
Description
Summary:10.1016/S0925-9635(03)00025-6

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