A broadband permeability measurement of FeTaN lamination stack by the shorted microstrip line method

10.1063/1.3054181

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Bibliographic Details
Main Authors: Chen, X., Ma, Y., Xu, F., Wang, P., Ong, C.K.
Other Authors: TEMASEK LABORATORIES
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/116900
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Institution: National University of Singapore