Study on advanced gate stack using high-k dielectric and metal electrode

Ph.D

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Bibliographic Details
Main Author:	HWANG WAN SIK
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	Metal electrode, high-k dielectrics, gate stacks, plasma etching, TaN, HfO2
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/13131
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Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-13131
record_format	dspace
spelling	sg-nus-scholar.10635-131312017-10-21T10:05:11Z Study on advanced gate stack using high-k dielectric and metal electrode HWANG WAN SIK ELECTRICAL & COMPUTER ENGINEERING CHO BYUNG-JIN CHAN SIU HUNG, DANIEL YOO WON JONG Metal electrode, high-k dielectrics, gate stacks, plasma etching, TaN, HfO2 Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T10:30:18Z 2010-04-08T10:30:18Z 2008-06-02 Thesis HWANG WAN SIK (2008-06-02). Study on advanced gate stack using high-k dielectric and metal electrode. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/13131 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
language	English
topic	Metal electrode, high-k dielectrics, gate stacks, plasma etching, TaN, HfO2
spellingShingle	Metal electrode, high-k dielectrics, gate stacks, plasma etching, TaN, HfO2 HWANG WAN SIK Study on advanced gate stack using high-k dielectric and metal electrode
description	Ph.D
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING HWANG WAN SIK
format	Theses and Dissertations
author	HWANG WAN SIK
author_sort	HWANG WAN SIK
title	Study on advanced gate stack using high-k dielectric and metal electrode
title_short	Study on advanced gate stack using high-k dielectric and metal electrode
title_full	Study on advanced gate stack using high-k dielectric and metal electrode
title_fullStr	Study on advanced gate stack using high-k dielectric and metal electrode
title_full_unstemmed	Study on advanced gate stack using high-k dielectric and metal electrode
title_sort	study on advanced gate stack using high-k dielectric and metal electrode
publishDate	2010
url	http://scholarbank.nus.edu.sg/handle/10635/13131
_version_	1681078805300510720

Study on advanced gate stack using high-k dielectric and metal electrode

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