A study of photomask defects on nanometer feature photolithography

Master's

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Main Author: TAN SIA KIM
Other Authors: MECHANICAL ENGINEERING
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/13623
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Institution: National University of Singapore
Language: English
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spelling sg-nus-scholar.10635-136232015-01-20T08:24:09Z A study of photomask defects on nanometer feature photolithography TAN SIA KIM MECHANICAL ENGINEERING QUAN CHENGGEN TAY CHO JUI Lithography, Photomask, Mask Error, MEEF, Defects,Reticle Master's MASTER OF ENGINEERING 2010-04-08T10:34:51Z 2010-04-08T10:34:51Z 2004-01-03 Thesis TAN SIA KIM (2004-01-03). A study of photomask defects on nanometer feature photolithography. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/13623 NOT_IN_WOS en
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
language English
topic Lithography, Photomask, Mask Error, MEEF, Defects,Reticle
spellingShingle Lithography, Photomask, Mask Error, MEEF, Defects,Reticle
TAN SIA KIM
A study of photomask defects on nanometer feature photolithography
description Master's
author2 MECHANICAL ENGINEERING
author_facet MECHANICAL ENGINEERING
TAN SIA KIM
format Theses and Dissertations
author TAN SIA KIM
author_sort TAN SIA KIM
title A study of photomask defects on nanometer feature photolithography
title_short A study of photomask defects on nanometer feature photolithography
title_full A study of photomask defects on nanometer feature photolithography
title_fullStr A study of photomask defects on nanometer feature photolithography
title_full_unstemmed A study of photomask defects on nanometer feature photolithography
title_sort study of photomask defects on nanometer feature photolithography
publishDate 2010
url http://scholarbank.nus.edu.sg/handle/10635/13623
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