A study of photomask defects on nanometer feature photolithography
Master's
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| Format: | Theses and Dissertations |
| Language: | English |
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2010
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| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/13623 |
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| Institution: | National University of Singapore |
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sg-nus-scholar.10635-136232015-01-20T08:24:09Z A study of photomask defects on nanometer feature photolithography TAN SIA KIM MECHANICAL ENGINEERING QUAN CHENGGEN TAY CHO JUI Lithography, Photomask, Mask Error, MEEF, Defects,Reticle Master's MASTER OF ENGINEERING 2010-04-08T10:34:51Z 2010-04-08T10:34:51Z 2004-01-03 Thesis TAN SIA KIM (2004-01-03). A study of photomask defects on nanometer feature photolithography. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/13623 NOT_IN_WOS en |
| institution |
National University of Singapore |
| building |
NUS Library |
| country |
Singapore |
| collection |
ScholarBank@NUS |
| language |
English |
| topic |
Lithography, Photomask, Mask Error, MEEF, Defects,Reticle |
| spellingShingle |
Lithography, Photomask, Mask Error, MEEF, Defects,Reticle TAN SIA KIM A study of photomask defects on nanometer feature photolithography |
| description |
Master's |
| author2 |
MECHANICAL ENGINEERING |
| author_facet |
MECHANICAL ENGINEERING TAN SIA KIM |
| format |
Theses and Dissertations |
| author |
TAN SIA KIM |
| author_sort |
TAN SIA KIM |
| title |
A study of photomask defects on nanometer feature photolithography |
| title_short |
A study of photomask defects on nanometer feature photolithography |
| title_full |
A study of photomask defects on nanometer feature photolithography |
| title_fullStr |
A study of photomask defects on nanometer feature photolithography |
| title_full_unstemmed |
A study of photomask defects on nanometer feature photolithography |
| title_sort |
study of photomask defects on nanometer feature photolithography |
| publishDate |
2010 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/13623 |
| _version_ |
1681078889421471744 |