Direct observations of nickel silicide formation on (100) Si and Si0.75Ge0.25 substrates using in-situ transmission electron microscopy

Direct observations of nickel silicide formation on (100) Si and Si0.75Ge0.25 substrates using in-situ transmission electron microscopy

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Bibliographic Details
Main Author: RAMESH NATH S/O PREMNATH
Other Authors: MATERIALS SCIENCE
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
nickel silicide, transmission electron microscope, in situ, agglomeration, nucleation, surface relaxation
Online Access:http://scholarbank.nus.edu.sg/handle/10635/14427
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Institution: National University of Singapore
Language: English

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http://scholarbank.nus.edu.sg/handle/10635/14427

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