Surface processing of nanoporous low dielectric constant thin films

Master's

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Main Author: LIU JUN
Other Authors: CHEMISTRY
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Online Access:https://scholarbank.nus.edu.sg/handle/10635/14604
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Institution: National University of Singapore
Language: English
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spelling sg-nus-scholar.10635-146042020-11-18T05:00:54Z Surface processing of nanoporous low dielectric constant thin films LIU JUN CHEMISTRY LOH KIAN PING Low-k, Porosity, Plasma treatment, Densified layer, Diffusion Barrier and BN Master's MASTER OF SCIENCE 2010-04-08T10:44:53Z 2010-04-08T10:44:53Z 2005-03-07 Thesis LIU JUN (2005-03-07). Surface processing of nanoporous low dielectric constant thin films. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/14604 NOT_IN_WOS en
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
language English
topic Low-k, Porosity, Plasma treatment, Densified layer, Diffusion Barrier and BN
spellingShingle Low-k, Porosity, Plasma treatment, Densified layer, Diffusion Barrier and BN
LIU JUN
Surface processing of nanoporous low dielectric constant thin films
description Master's
author2 CHEMISTRY
author_facet CHEMISTRY
LIU JUN
format Theses and Dissertations
author LIU JUN
author_sort LIU JUN
title Surface processing of nanoporous low dielectric constant thin films
title_short Surface processing of nanoporous low dielectric constant thin films
title_full Surface processing of nanoporous low dielectric constant thin films
title_fullStr Surface processing of nanoporous low dielectric constant thin films
title_full_unstemmed Surface processing of nanoporous low dielectric constant thin films
title_sort surface processing of nanoporous low dielectric constant thin films
publishDate 2010
url https://scholarbank.nus.edu.sg/handle/10635/14604
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