Surface processing of nanoporous low dielectric constant thin films
Master's
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sg-nus-scholar.10635-146042020-11-18T05:00:54Z Surface processing of nanoporous low dielectric constant thin films LIU JUN CHEMISTRY LOH KIAN PING Low-k, Porosity, Plasma treatment, Densified layer, Diffusion Barrier and BN Master's MASTER OF SCIENCE 2010-04-08T10:44:53Z 2010-04-08T10:44:53Z 2005-03-07 Thesis LIU JUN (2005-03-07). Surface processing of nanoporous low dielectric constant thin films. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/14604 NOT_IN_WOS en |
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National University of Singapore |
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Singapore Singapore |
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English |
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Low-k, Porosity, Plasma treatment, Densified layer, Diffusion Barrier and BN |
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Low-k, Porosity, Plasma treatment, Densified layer, Diffusion Barrier and BN LIU JUN Surface processing of nanoporous low dielectric constant thin films |
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Master's |
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CHEMISTRY |
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CHEMISTRY LIU JUN |
format |
Theses and Dissertations |
author |
LIU JUN |
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LIU JUN |
title |
Surface processing of nanoporous low dielectric constant thin films |
title_short |
Surface processing of nanoporous low dielectric constant thin films |
title_full |
Surface processing of nanoporous low dielectric constant thin films |
title_fullStr |
Surface processing of nanoporous low dielectric constant thin films |
title_full_unstemmed |
Surface processing of nanoporous low dielectric constant thin films |
title_sort |
surface processing of nanoporous low dielectric constant thin films |
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2010 |
url |
https://scholarbank.nus.edu.sg/handle/10635/14604 |
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