The Effects of Process Parameters on Electrical Properties of Phosphorus Implanted Polysilicon Deposited by LPCVD

The Effects of Process Parameters on Electrical Properties of Phosphorus Implanted Polysilicon Deposited by LPCVD

Master's

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Bibliographic Details
Main Author: AN TAO
Other Authors: SINGAPORE-MIT ALLIANCE
Format: Theses and Dissertations
Published: 2019
Subjects:
electrical properties
polysilicon
LPCVD
phosphorus implanted
process parameters
sheet resistance
temperature
pressure
mass flow rate
uniformity
Online Access:https://scholarbank.nus.edu.sg/handle/10635/153883
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Institution: National University of Singapore
id sg-nus-scholar.10635-153883
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spelling sg-nus-scholar.10635-1538832019-05-16T06:41:08Z The Effects of Process Parameters on Electrical Properties of Phosphorus Implanted Polysilicon Deposited by LPCVD AN TAO SINGAPORE-MIT ALLIANCE YOON SOON FATT WONG KUM FAI electrical properties polysilicon LPCVD phosphorus implanted process parameters sheet resistance temperature pressure mass flow rate uniformity Master's MASTER OF SCIENCE IN ADVANCED MATERIALS FOR MICRO- & NANO- SYSTEMS 2019-05-09T04:10:20Z 2019-05-09T04:10:20Z 2008 Thesis AN TAO (2008). The Effects of Process Parameters on Electrical Properties of Phosphorus Implanted Polysilicon Deposited by LPCVD. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/153883 SMA BATCHLOAD 20190422
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
topic electrical properties
polysilicon
LPCVD
phosphorus implanted
process parameters
sheet resistance
temperature
pressure
mass flow rate
uniformity
spellingShingle electrical properties
polysilicon
LPCVD
phosphorus implanted
process parameters
sheet resistance
temperature
pressure
mass flow rate
uniformity
AN TAO
The Effects of Process Parameters on Electrical Properties of Phosphorus Implanted Polysilicon Deposited by LPCVD
description Master's
author2 SINGAPORE-MIT ALLIANCE
author_facet SINGAPORE-MIT ALLIANCE
AN TAO
format Theses and Dissertations
author AN TAO
author_sort AN TAO
title The Effects of Process Parameters on Electrical Properties of Phosphorus Implanted Polysilicon Deposited by LPCVD
title_short The Effects of Process Parameters on Electrical Properties of Phosphorus Implanted Polysilicon Deposited by LPCVD
title_full The Effects of Process Parameters on Electrical Properties of Phosphorus Implanted Polysilicon Deposited by LPCVD
title_fullStr The Effects of Process Parameters on Electrical Properties of Phosphorus Implanted Polysilicon Deposited by LPCVD
title_full_unstemmed The Effects of Process Parameters on Electrical Properties of Phosphorus Implanted Polysilicon Deposited by LPCVD
title_sort effects of process parameters on electrical properties of phosphorus implanted polysilicon deposited by lpcvd
publishDate 2019
url https://scholarbank.nus.edu.sg/handle/10635/153883
_version_ 1681099309461798912

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