Bimodal distribution of damage morphology generated by ion implantation

Bimodal distribution of damage morphology generated by ion implantation

10.1016/j.mseb.2005.08.099

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書目詳細資料
Main Authors: Mok, K.R.C., Jaraiz, M., Martin-Bragado, I., Rubio, J.E., Castrillo, P., Pinacho, R., Srinivasan, M.P., Benistant, F.
其他作者: CHEMICAL & BIOMOLECULAR ENGINEERING
格式: Conference or Workshop Item
出版: 2014
主題:
Damage
Implant temperature
Ion-implant
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/90521
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機構: National University of Singapore

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