Ion-implant simulations: The effect of defect spatial correlation on damage accumulation

Ion-implant simulations: The effect of defect spatial correlation on damage accumulation

10.1016/j.mseb.2005.08.100

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Bibliographic Details
Main Authors: Mok, K.R.C., Jaraiz, M., Martin-Bragado, I., Rubio, J.E., Castrillo, P., Pinacho, R., Srinivasan, M.P., Benistant, F.
Other Authors: CHEMICAL & BIOMOLECULAR ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Crystal-amorphous
Ion-implant simulation
Spatial correlation
Online Access:http://scholarbank.nus.edu.sg/handle/10635/90600
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/90600

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