Bimodal distribution of damage morphology generated by ion implantation

Bimodal distribution of damage morphology generated by ion implantation

10.1016/j.mseb.2005.08.099

Saved in:
Bibliographic Details
Main Authors: Mok, K.R.C., Jaraiz, M., Martin-Bragado, I., Rubio, J.E., Castrillo, P., Pinacho, R., Srinivasan, M.P., Benistant, F.
Other Authors: CHEMICAL & BIOMOLECULAR ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Damage
Implant temperature
Ion-implant
Online Access:http://scholarbank.nus.edu.sg/handle/10635/90521
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Similar Items

Similar Items